The integration of in situ argon plasma annealing results in improved film density, stoichiometry, and crystallinity. These findings are significant for industries looking for cost-effective, ...
ASM International N.V. has launched two new advanced deposition systems. The new systems deliver industry-leading process performance for epitaxy, plasma enhanced atomic layer deposition (PEALD) and ...
Layerava from Okyay Tech is an adaptable research device designed for university and industrial research laboratories that use Hollow Cathode Plasma Enhanced Atomic Layer Deposition (HCP-ALD).
The Nature Index 2025 Research Leaders — previously known as Annual Tables — reveal the leading institutions and countries/territories in the natural and health sciences, according to their output in ...
The Nature Index 2025 Research Leaders — previously known as Annual Tables — reveal the leading institutions and countries/territories in the natural and health sciences, according to their output in ...
A team of international researchers has simplified the deposition of thin film layers in the commercial production of TOPCon solar cells. Via a tube-type industrial plasma-assisted atomic layer ...
With this collaboration, IME and Picosun will jointly develop innovative ALD and plasma-enhanced ALD (PEALD) processes for novel dielectrics and metals for applications in resistive switching ...
Atomic Limits, a blog site that addresses atomic-level processing technologies, has developed an online database listing all atomic layer deposition (ALD) materials and processes. The database could ...
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